发明名称 Bipolar semiconductor structure with epitaxial layer
摘要 The bipolar semiconductor structure has an epitaxial layer (3) of first conductivity type arranged on a substrate (1). Diffusion zones (5) of second conductivity type are arranged in the epitaxial layer. To prevent a conductivity inversion at the surface of the epitaxial layer in the entire wafer region without using masks dopant atoms of the first conductivity type are introduced and are electrically activated so that a near surface doping gradient of the first conductivity type is realised.
申请公布号 DE4343397(A1) 申请公布日期 1995.06.22
申请号 DE19934343397 申请日期 1993.12.18
申请人 TEMIC TELEFUNKEN MICROELECTRONIC GMBH, 74072 HEILBRONN, DE 发明人 TOLONICS, JOHANN, DIPL.-ING. DR., 74081 HEILBRONN, DE
分类号 H01L29/06;(IPC1-7):H01L29/73 主分类号 H01L29/06
代理机构 代理人
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