Bipolar semiconductor structure with epitaxial layer
摘要
The bipolar semiconductor structure has an epitaxial layer (3) of first conductivity type arranged on a substrate (1). Diffusion zones (5) of second conductivity type are arranged in the epitaxial layer. To prevent a conductivity inversion at the surface of the epitaxial layer in the entire wafer region without using masks dopant atoms of the first conductivity type are introduced and are electrically activated so that a near surface doping gradient of the first conductivity type is realised.
申请公布号
DE4343397(A1)
申请公布日期
1995.06.22
申请号
DE19934343397
申请日期
1993.12.18
申请人
TEMIC TELEFUNKEN MICROELECTRONIC GMBH, 74072 HEILBRONN, DE
发明人
TOLONICS, JOHANN, DIPL.-ING. DR., 74081 HEILBRONN, DE