发明名称 Cleaning processing tank for exposed film
摘要 The film (1) is dipped in a bath of cleaning fluid in the wet cleaning station (10) which is directly followed by a drier (20) working by circulating air. The dry cleaning station (30) is in the form of an ionising appts. contg. electrostatic discharge equipment (31-34) as well as soft hair brushes (33,34) for the removal of charged dust particles. The wet cleaning station and drier are switched in according to the degree of dirt on the film. An ultrasonic generator (14), pref. in the form of a row of emitters, is assigned to the wet cleaning station to help in removing the dirt particles by ultrasonic waves. The film is pulled through by a motor-driven capstan roller (70) followed by a film wind-up roller (60) with a drive motor having its r.p.m. controlled according to the duration required in the cleaning stations.
申请公布号 DE4343032(A1) 申请公布日期 1995.06.22
申请号 DE19934343032 申请日期 1993.12.16
申请人 SCHMITZER, ANDREAS, 93309 KELHEIM, DE 发明人 MANEWALD, INGRID, 93326 ABENSBERG, DE
分类号 B08B3/04;B08B6/00;G03D15/02;(IPC1-7):G03D15/00 主分类号 B08B3/04
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