发明名称
摘要 A suspended microstructure fabrication process. Photoresist pedestals are inserted in a sacrificial layer between the suspended microstructure and the substrate and photoresist spacers are inserted in the microstructure layer between non contacting portions of the suspended microstructure so that the photoresist pedestals and spacers support the microstructure bridge during the wet etching and drying process used to remove the sacrificial layer.
申请公布号 JPH07505743(A) 申请公布日期 1995.06.22
申请号 JP19930518412 申请日期 1993.04.05
申请人 发明人
分类号 B81B3/00;B81C99/00;G01P15/08;G01P15/125;G01P15/13;H01L21/306;H01L21/764;H01L29/84;(IPC1-7):H01L29/84 主分类号 B81B3/00
代理机构 代理人
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