| 摘要 |
PURPOSE:To obtain a pattern size having good intra-surface uniformity by providing a substrate heater with a hot plate having a heater, a lower cap enclosing this hot plate, an upper cap having a circular conical-shaped inside surface and a gas introducing pipe disposed in this lower cap, thereby uniformly heating a substrate. CONSTITUTION:The lower cap 3 and the upper cap 4 are so pressed as to prohibit the inflow of cold air from sideways and enclose the hot plate 1 heated by a heater 2. The gas introducing pipe 7 consisting of metal is disposed between the lower cap 3 and the hot plate 1 and a slight amt. of gaseous nitrogen is sufficiently heated and introduced by the introducing pipe 7 from an air suction port 8 and is discharged from discharge ports 9a to 9d. The inside surface 5 of the upper cap 4 is formed to the circular conical shape having a gentle inclination, for example, an inclination of about 10 deg., by which a base body contg. an org. solvent of the heated resist is gently risen and is discharged from a discharge port 6 at the top. Further, a photomask 10 is placed on the hot plate 1 by lifting the upper cap 4 upward by a driving mechanism. At this time, the temp. is maintained more uniformly as the upper space of the photomask 10 is smaller and, therefore, uniform baking is possible. |
