| 摘要 |
<p>PURPOSE:To create pattern-arrangement-instruction information more precisely and to easily investigate a cause when an inaccurate photomask has been formed in an original-plate pattern. CONSTITUTION:Original-picture patterns which are drawn on a photmask blank are changed into pieces of data wholly or at every element (T11). On the basis of the individual pieces of pattern data, pieces of data, for arrangement, which prescribe regions of the individual pieces of pattern data in which coordinates are expressed by a coordinate system related to the individual pieces of pattern data are created (T12). The coordinates of peculiar points in the photomask blank are found in a coordinate system which the individual pieces of data for arrangement follow, and pieces of intermediate-pattern-arrangement- instruction information which give instructions to arrange the individual pieces of data for arrangement are created in such a way that the coordinates of the peculiar points are situated in the peculiar points in the photomask blank (T13). The individual pieces of intermdiate-pattern-arrangement-instruction information are transformed into pieces of final pattern-arrangement-instruction information having a form which can be taken into by a drawing apparatus.</p> |
