| 摘要 |
A plasma generating apparatus includes a vacuum chamber (1), an inductive-coupling coil (2) wound around the vacuum chamber, a pair of parallel-planar electrodes (3, 4), each of which electrode has a center on a central axis of the inductive-coupling coil within the vacuum chamber, and is disposed vertically against the central axis, a radio-frequency power supply (6), and a radio-frequency matching circuit (5) coupled to the radio-frequency power supply. The radio-frequency matching circuit is coupled to at least one of the inductive-coupling coil and the pair of parallel-planar electrodes. The pair of parallel-planar electrodes and the inductive-coupling coil driven by the radio-frequency power supply carry out capacitive-coupling and inductive-coupling so as to be associated with each other, so that capacitively-coupled plasma and inductively-coupled plasma are generated within the vacuum chamber. <IMAGE> |
