发明名称 |
MATERIAL RESIST |
摘要 |
Photoacid generators advantageous for use in applications such as photoacid generators used in chemically amplified resists are disclosed. These compounds are based on an ortho nitro benzyl configuration employing an alpha substituent having high bulk, steric characteristics, and electron withdrawing ability. The enhanced efficacy is particularly found in compounds both having a suitable alpha substituent and a second ortho substituent with large electron withdrawing and steric effects. |
申请公布号 |
JPH07149710(A) |
申请公布日期 |
1995.06.13 |
申请号 |
JP19940134744 |
申请日期 |
1994.06.17 |
申请人 |
AMERICAN TELEPH & TELEGR CO <ATT> |
发明人 |
EBURIN CHIN;FURANSHISU MAIKERU HOORIHAN;OMUKARAMU NARAMASU |
分类号 |
C07C309/67;C07C309/69;C07C309/70;G03F7/004;G03F7/038;H01L21/027;(IPC1-7):C07C309/67 |
主分类号 |
C07C309/67 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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