| 摘要 |
PURPOSE:To obtain a thin film prevented in the generation of particulate projections due to the excessive supply of a catalyst, etc., and suitable for radiation-sensitive resists by evacuating a reactor, and subsequently charging a vaporized catalyst and a monomer to form a polymer thin film on a substrate. CONSTITUTION:In a method for producing a polymer thin film on a substrate by charging a catalyst and a monomer into an evacuated reactor, the reactor 1 is evacuated, and subsequently the vaporized catalyst 2 and the monomer 3 are simultaneously charged into the evacuated reactor 1 to form a polymer thin film on the substrate. An ethylenic compound or acetylenic compound having a polymerizable unsaturated bond is used as the monomer. When an electromagnetic wave or light having a wavelength of >=150nm or a mercury light blight line having a wavelength of 436nm is applied, the formed thin film can be used as an effective lower layer resist. The monomer is preferably vinylidene cyanide, cyanoacetylene, etc., in which an electron-attracting group such as cyano or nitrile is bound to an unsaturated bond-having carbon. The catalyst includes triethylamine. The substrate is preferably a silicon substrate, a germanium substrate, etc., which are effective in processes for producing semiconductor integrated circuits. |
