| 摘要 |
PURPOSE:To recover the substrate of an article having an organosilicon coating layer and/or an oxide coating layer by immersing the article in an aq. soln. contg. a hydrogen fluoride compd. and hydrogen peroxide. CONSTITUTION:An organosilicon coating layer is formed from a coating soln. contg. an organosilicon compd. of the formula: R<1>aR<2>bSi(OR<3>)4-a-b (wherein R<1> and R<2> are each alkyl, alkenyl, aryl, halogen, glycidoxy, epoxy, amino, mercapto, methacryloxy, or cyano; R<3> is 1-8C alkyl, alkoxyalkyl, acyl, phenyl, or allylalkyl; and a and b are each 0 or 1) and/or its hydrolysate. Oxide particles contained in the coating soln. are particles of silicon oxide, antimony oxide, etc., having particle sizes of 1-300nm. The concns. of a hydrogen fluoride compd. and hydrogen peroxide in an aq. soln. are 1-40wt.% and 1-50wt.%, respectively, the sum of concns. of the two compds. being pref. 5-50-wt.%. Pref. the immersion time is 30sec to 8hr and the immersion temp. is 5-40 deg.C. |
