发明名称 Powder beam etching method
摘要 In a powder beam etching method, a nozzle for injecting fine particles and a work are moved relative to each other in two perpendicular directions, viz., a scanning direction and a feed pitch direction during each scanning motion. During each return scanning motion the path followed is arranged to fall in between the path of the preceding forward motion.
申请公布号 US5423713(A) 申请公布日期 1995.06.13
申请号 US19930138269 申请日期 1993.10.20
申请人 SONY CORPORATION 发明人 MISHIMA, AKIO
分类号 B24C3/12;B24C1/00;B24C1/04;B24C3/32;B24C9/00;(IPC1-7):B24C1/04 主分类号 B24C3/12
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