<p>A photoimageable composition for forming a solder mask has a photopolymerizable acrylate chemical system which renders exposed portions insolvable to alkaline aqueous developers and an epoxy chemical system which hardens the composition after exposure and development. The acrylate chemical system comprises acrylate monomers, epoxy-acrylate oligomers and a photoinitiator. The epoxy chemical system comprises an epoxy resin and a curative therefore. The composition further comprises a cross-linking agent which is reactive with hydroxyl groups of the acrylate and epoxy chemical systems.</p>
申请公布号
DE69019067(D1)
申请公布日期
1995.06.08
申请号
DE1990619067
申请日期
1990.06.08
申请人
MORTON INTERNATIONAL, INC., CHICAGO, ILL., US
发明人
FLYNN, KATHY M., IRVINE, CALIFORNIA 92715, US;VINAI, M. TARA, ANAHEIM, CALIFORNIA 92804, US;NELSON, KATHLEEN L., PASADENA, CALIFORNIA 91106, US