Semiconductor device and reticle used for fabricating the same

摘要

A semiconductor device is provided with a device formation region formed by etching with using a reticle as an etching mask. The device formation region is shaped to have at least two curved portions having different radiuses, being encircled with an insulation layer, so that radiated light is not converged to a point of an inside of the device formation region by light reflection on an inner edge of the insulation layer.