PHASE SHIFT MASK AND METHOD FOR CORRECTING DEFECT OF PHASE SHIFT MASK

摘要

PURPOSE:To correct the defect of a phase shifter part without impairing the function of the phase shift mask by arranging a specific correcting member in the specific phase shifter defective part disposed in a region including the boundary between a light transparent part and the phase shifter part. CONSTITUTION:This phase shift mask 1 has the light transparent part 4 where the surface of a transparent quartz substrate 16 is exposed and the phase shifter part 2 which consists of a nitrogen oxide film of MoSi, etc., formed on the transparent substrate 16 and where the transmittance of exposing light is smaller than the transmittance of exposing light of the light transparent part 4 and a phase difference from the exposing light transmitted through the light transparent part 4 attains 180 deg.. The phase shifter defective part 6 where a part of the phase shifter part 2 is lacked is disposed in the region including the boundary between the light transparent part 4 and the phase shifter part 2. The phase shifter defective part 6 is filled by the correcting member 8 having the nearly same transmittance and the phase difference as the transmittance and the phase difference of the phase shifter 2. As a result, the effect similar to the effect of the phase shift mask is obtd. even by the exposing light transmitted through the correction region of the phase shifter defective part 6. Execution of exposing with high accuracy is thus possible.