发明名称 Method for producing a thin film, and a semiconductor device having the thin film
摘要 Chalcopyrite compound semiconductor thin films represented by I-III-VI2-xVx or I-III-VI2-xVIIx, and semiconductor devices having a I-III-VI2/I-III-VI2-xVx or I-III-VI2/I-III-VI2-xVIIx chalcopyrite homojunction are provided. Such chalcopyrite compound semiconductor thin films are produced by radiating molecular beams or ion beams of the I, III, VI, and V or VII group elements simultaneously, or by doping I-III-VI2 chalcopyrite thin films with VII-group atoms after the formation thereof. Pollution-free solar cells are also provided, which are formed by the steps of forming a structure of a lower electrode, a chalcopyrite semiconductor thin film, and an upper electrode and radiating accelerated ion beams of a V, VII, or VIII group element thereto.
申请公布号 US5422304(A) 申请公布日期 1995.06.06
申请号 US19940309552 申请日期 1994.09.20
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 KOHIKI, SHIGEMI;NEGAMI, TAKAYUKI;NISHITANI, MIKIHIKO;WADA, TAKAHIRO
分类号 C01B19/04;C01G1/00;H01L21/203;H01L31/032;H01L31/04;H01L31/068;H01L31/10;(IPC1-7):H01L21/20 主分类号 C01B19/04
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