发明名称 |
Photomask and method of manufacturing the same |
摘要 |
A first anti-reflection film is inserted between a transparent glass substrate and the light shielding pattern. The first anti-reflection film has a refractive index larger than that of the glass substrate but smaller than that of the light shielding pattern. A second anti-reflection film is formed on the glass substrate between adjacent light shielding patterns. The second anti-reflection film has a refractive index larger than that of air but smaller than that of the glass substrate. Thus, a light beam entering the glass substrate is not reflected at the front surface of the glass substrate regardless of whether the light beam entered in a portion provided with a light shielding pattern.
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申请公布号 |
US5422206(A) |
申请公布日期 |
1995.06.06 |
申请号 |
US19940218847 |
申请日期 |
1994.03.28 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
KAMON, KAZUYA |
分类号 |
G03F1/54;G03F1/68;G03F1/80;H01L21/027;H01L21/30;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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