| 摘要 |
An abrasive cloth dresser which can efficiently remove reaction products soaked into abrasive cloths for polishing semiconductor wafers etc. without scattering the reaction products. The abrasive cloth dresser includes a rotating hollow arm shaft 7, a high-pressure pure water jetting head 8 provided at a distal end of the hollow arm shaft, and a brush hood 11 provided at a distal end of the high-pressure pure water jetting head 8 and having a brush 16 planted thereto. The high-pressure pure water jetting head 8 includes a jet nozzle 83 through which high-pressure pure water is jetted for impacting reaction products soaked into a piece of abrasive cloth 3 to come out for removal. The brush 16 is elliptical in shape, and has a planted bristle density which is lower in a brush left-hand portion 161 near the high-pressure pure water injection center IC, but higher in a brush central portion 162 and a brush right-hand portion 163. Accordingly, the spent pure water and the reaction products are caused to reside in a pure water pool area WP, following which the pure water having lost energy and the reaction products are discharged through the brush left-hand portion 161 without scattering to the surroundings. |
