| 摘要 |
PURPOSE:To easily regenerate an expensive member provided with film without practically damaging the surface of a substrate by heating the member formed by coating the substrate surface with a hard film to a specified high temp. from room temp., then cooling the substrate, repeating the process to remove the hard film and then forming a hard film. CONSTITUTION:A hard film consisting of at least one kind among boron nitride, chromium nitride, titanium nitride and chromium oxide is formed on the surface of a substrate formed from a sintered compact consisting of at least one kind between silicon carbide and silicon nitride to obtain a member provided with film. The substrate is regenerated as follows. Namely, the substrate is heated to a specified temp. and then cooled in a nitrogen atmosphere, and the process is repeated to remove the hard film. A hard film consisting of at least one kind among boron nitride, chromium nitride, titanium nitride and chromium oxide is then formed on the substrate. The heating is preferably conducted from room temp. to <=1200 deg.C, preferably to 700-1000 deg.C. |
