| 摘要 |
<p>PURPOSE:To provide the method for evaluating photomask patterns capable of adequately evaluating the normal/defective condition of patterns for transfer formed on a photomask to be used at the time of executing exposure by using an exposure device provided with a function to correct the transfer patterns and its device as well as the pattern transfer method utilizing the method for evaluating the photomask pattern. CONSTITUTION:Actually measured coordinate data are determined by measuring the coordinate values of the positions at >=2 reference points in the patterns formed on the photomask 1 by an instrument 2 for actually measuring the coordinate values. Next, both data are compared by a function 3 of a computer 100 to determine the relative positions of the actually measured coordinate data and design coordinate data. The actually measured coordinate are subjected to a correction equal to the correction by the function to correct the transfer patterns with which an exposure device is equipped, by which the coordinate systems of both data are superposed and aligned and the relative positions of both data are determined in such a manner that the overall deviations of the actually measured coordinate data after the correction and the design coordinate data are minimized in view of statistics. Whether the individual deviations of both data in the positions where the relative positions are determined are within a permissible range or not is then evaluated by the deviation determining function 4 of the computer 100.</p> |
