SEMICONDUCTOR ALIGNER AND EXPOSURE METHOD

摘要

PURPOSE:To provide a semiconductor aligner having a deep focus. CONSTITUTION:A semiconductor aligner has a laser light source 10 and second harmonic generators 20 which receive light beams emitted from the laser light source 10 and emit light beams having wavelengths based upon the second harmonics of the incident light beams. A plurality of the second harmonic generators 20 having an etalon 27 are provided and the wavelengths of the light beams emitted from the respective second harmonic generators 20 are made different from each other by the etalon 27. Or, a semiconductor aligner has a laser light source and a second harmonic generator which receives a light beam emitted from the laser light source and emits a light beam having a wavelength based upon the second harmonic of the incident light beam. An etalon is also provided and the wavelength of a light beam emitted from the second harmonic generator is varied by the wavelength dispersion device.