| 摘要 |
PURPOSE:To detect position over a wider range than the formation region of an alignment mark along the scanning region of reticle or wafer and at the same time prevent a beat signal obtained when using heterodyne system from being frequency-modulated. CONSTITUTION:By scanning a wafer 12 in Y direction for an exposure region 17 in synchronization with the scanning of a reticle 2 in -Y direction for a lighting region 4, the pattern of the reticle 2 is exposed on the wafer 12. Reticle marks 6A, 6B,... are formed on the reticle 2, wafer marks 15A, 15B,... are formed on the wafer 12, and alignment light AL from a light transmission system 9 is vibrated by a galvano mirror 21, thus tracking the reticle mark and wafer mark with the alignment light AL. |
