首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM DEFLECTION METHOD
摘要
申请公布号
JPH07142351(A)
申请公布日期
1995.06.02
申请号
JP19930287896
申请日期
1993.11.17
申请人
NEC CORP
发明人
YAMASHITA HIROSHI
分类号
G21K5/04;G03F7/20;H01J37/147;H01L21/027;(IPC1-7):H01L21/027
主分类号
G21K5/04
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Electrochemical oxygen sensing element, particularly for determination of oxygen content in the exhaust gases of automotive internal combustion engines
Method of ion plating a thin metallic strip for flashlamp starting
Printed circuit cover coating comprising an ultraviolet radiation sensitive acrylic resin
Method of operating an electrolysis cell
Process for dephosphorizing molten pig iron
Laundry dryer
Electric blower assembly having volute passages to direct air into motor housing
Nose tip locking device
Alcohol production
Deformation imaging element
Anti-jackknife apparatus
Method of removing printing press rollers and removal mechanism for use therein
Flow control device
Engine mounting apparatus
Kite reel system
Dual spool retractor
Repair gun for coke ovens
Circulating water heater
Dual action control mechanism
Container-filling machine with fill adjustment during operation
