RESIST RINSING SOLUTION AND RESIST DEVELOPING METHOD

摘要

PURPOSE:To provide a resist rinsing solution capable of improving resolution by solving the problem of pattern deformation caused by too large surface tension of pure water used as a rinsing solution in the developing process of the resist and to provide a resist developing method using the rinsing solution. CONSTITUTION:In the resist development of a resist material containing a novolak resin and a hydroxypolystyrene resin as base materials, the resist rinsing solution having 30-50dyn/cm surface tension is used for solving the problem of pattern deformation caused by a resist rinsing solution used for resist developing.