发明名称 NEGATIVE PHOTORESIST COMPOSITION AND ETCHING METHOD
摘要 PURPOSE:To obtain the composition contg. an acid generating agent enhanced in sensitivity to photolysis, with the sensitivity enhanced, capable of obtaining a high resolving power and suppressing lack of development by incorporating specified photosensitive s-triazine compd., novolac resin, acid cross-linkable compd. and solvent. CONSTITUTION:A photosensitive s-triazine compd. shown by formula I or II, novolac resin, an acid cross-linkable compd. and a solvent consisting essentially of propylene glycol monoalkyl ether and/or its esters are combined to constitute a photo-acid generating agent. In formulas I and II, R1 and R2 can be the same or different and are haloalkyls having 1-3 carbon atoms or haloalkenyls, R3 is hydrogen atom or methyl, R4 is the aryls or heterocyclic groups capable of being substituted, and (n) is 1 or 2. The known vinylhalomethyl-s-triazine compd. or arylhalomethyl-s-triazine compd. are exemplified as the compd. shown by the formula.
申请公布号 JPH07140653(A) 申请公布日期 1995.06.02
申请号 JP19930251778 申请日期 1993.10.07
申请人 FUJI PHOTO FILM CO LTD 发明人 YOSHIMOTO HIROSHI;KOKUBO TADAYOSHI
分类号 C08F2/48;C08K5/3492;G03F7/004;G03F7/029;G03F7/038;H01L21/02;H01L21/30;(IPC1-7):G03F7/029 主分类号 C08F2/48
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