| 摘要 |
PURPOSE:To provide a projection exposure device with a pattern position detec tion device which can detect an alignment mark accurately by preventing an asymmetry in a detected waveform caused by the irregularity in the thickness of a resist film. CONSTITUTION:In the title device with a TTLL-system alignment mark detection optical system. an incoherent light source 203 with a wide wavelength is used as the illumination light of the detection optical system, thus preventing the asymmetry of a detection waveform caused by the irregularity in the thickness of resist. Color aberration of return light generated by incoherent light is compensated by a color aberration compensation lens 216 which is laid out at a detection light path 206. Also, a space filter 218 for properly performing diffraction light detection or bright visual field detection is set to the detection light path 206. Therefore, even if a thickness irregularity is generated in the resist film, the symmetry of the detection waveform is improved, thus accurately detecting the position for forming an alignment mark. |
