<p>Electroactive passivation films for semiconductor components which have the properties required for this application to a high degree are composed of a thin layer of amorphous, hydrogen-containing carbon.</p>
申请公布号
EP0381111(B1)
申请公布日期
1995.05.31
申请号
EP19900101718
申请日期
1990.01.29
申请人
SIEMENS AKTIENGESELLSCHAFT
发明人
BIRKLE, SIEGFRIED, DR.;KAMMERMAIER, JOHANN, DR.;SCHMIDT, GERHARD, DR.;WINNACKER, ALBRECHT, PROF. DR.
