发明名称
摘要 PURPOSE:To form a calibration line without using any standard sample by tracing the migration process of an electron when an electron is made incident on a virtual sample whose concentration is already known by a simulating method based on probability arithmetic as to many electrons. CONSTITUTION:When the electron is accelerated and made incident on a sample, the electron travels while repeatedly colliding against and repelling an atom. constituting the sample. The track of this electron in the sample is determined on a probability basis and can be simulated by a computer. This simulation is carried out many times to find the probability that the characteristic X rays of a target element to be determined is radiated by the electron at certain depth from the sample surface. In the relational graph of the found X-ray radiation probability and the depth from the sample surface, the integration of the probability from depth 0 to depth (t) is proportional to the characteristic X-ray radiation intensity of the target element of the sample. The concentration of the target element, on the other hand, is assumed previously, so the relation between the assumed concentration and the radiation intensity of the characteristic X rays is found and the calibration line can be formed.
申请公布号 JPH0750044(B2) 申请公布日期 1995.05.31
申请号 JP19880045287 申请日期 1988.02.27
申请人 发明人
分类号 G01N23/225;H01J37/244 主分类号 G01N23/225
代理机构 代理人
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