| 发明名称 |
Charged particle beam exposure apparatus |
| 摘要 |
A barrier electrode is formed above an article to be exposed so as to be opposite the surface of the article to be exposed. A voltage is applied to the barrier electrode so as to form a barrier electric field surrounding the optical axis of a charged particle beam and surrounding the article to be exposed.
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| 申请公布号 |
US5420433(A) |
申请公布日期 |
1995.05.30 |
| 申请号 |
US19940214415 |
申请日期 |
1994.03.18 |
| 申请人 |
FUJITSU LIMITED |
发明人 |
OAE, YOSHIHISA;TAKAHASHI, YASUSHI;YASUDA, HIROSHI |
| 分类号 |
H01L21/027;G03F7/20;H01J37/30;(IPC1-7):H01J37/317 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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