| 摘要 |
In method and apparatus for measuring a refractive index and a thickness of a thin film formed on a substrate, the thin film has m (m>/=1) layers and a transparent uppermost layer is set as a first layer. A total of (3m+1) parameters include a refractive index n(0) of an incident medium, a refractive index n(j) (j=1 to m) of a j-th layer, absorption coefficients k(j) (j=2 to m) of second to m-th layers, a refractive index n(m+1) and an absorption coefficient k(m+1) of the substrate, and thicknesses d(j) (j=2 to m) of the second to m-th layers. Arbitrary one of the (3m+1) parameters is unknown and the other 3m parameters are known. This method and apparatus measure the unknown parameter. Monochromatic light having a wavelength is incident to the film having the m-layers at a predetermined incident angle from a first layer side in the incident medium to measure reflectances about S and P polarized light. A function of the unknown parameter is specified using measured values of the reflectances, the wavelength and 3m known parameters. An equation about this function is numerically solved to determine the unknown parameter.
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