发明名称 Photopolymerizable composition for use in an alkaline-etch resistant dry film photoresist
摘要 In an aqueous-developable dry-film photoresist containing a carboxyl-group containing film-forming polymeric binder, the improvement wherein the binder is obtained by polymerizing a mixture including: (a) a monomer of the formula H2C=CRCOO[(CnH2n)X(CpH2p)]mR', wherein R is hydrogen or methyl and R' is a saturated or unsaturated C5-C12 bridged alkyl optionally substituted by at least one C1-C4 alkyl or halogen, X is oxygen or sulfur, n is 2-4, p is 0-4, m is 0-2; and (b) at least one C3-C15 alpha , beta -unsaturated carboxyl-containing monomer having 3-15 carbon atoms.
申请公布号 US5419998(A) 申请公布日期 1995.05.30
申请号 US19940279986 申请日期 1994.07.25
申请人 HERCULES INCORPORATED 发明人 MAYES, RICHARD T.;POHL, RUDOLPH L.
分类号 G03F7/004;G03F7/027;G03F7/031;G03F7/033;G03F7/038;G03F7/26;H01L21/027;H05K3/00;H05K3/18;(IPC1-7):G03F7/033 主分类号 G03F7/004
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