PRODUCTION OF FLUORIDE THIN FILM AND FLUORIDE THIN FILM PRODUCED BY THE SAME

摘要

PURPOSE:To produce the fluoride thin film having a high adhesion property and packing rate and no possibility of a fluorine drop-out. CONSTITUTION:A vacuum chamber 1 is evacuated to a prescribed high vacuum degree and the partial pressure of water is controlled to <=5X10<-6>Torr. The evaporated particles of a fluoride are generated from at least one among cluster beam evaporating sources 3 to 6 and are deposited in an electrically neutral state on a work W without ionization. The formed fluoride thin film is amorphous and has the high adhesion property and packing rate and no possibility of the fluorine dropout.