发明名称 PULSED ION BEAM SOURCE
摘要 <p>An improved magnetically-confined anode plasma pulsed ion beam source (25). Beam rotation effects and power efficiency are improved by a magnetic design which places the separatrix between the fast field flux structure (408) and the slow field structure (414) near the anode (410) of the ion beam source, by a gas port design (404, 406) which localizes the gas delivery into the gap between the fast coil (408) and the anode (410), by a pre-ionizer ringing circuit connected to the fast coil, and by a bias field means (180) which optimally adjusts the plasma formation position in the ion beam source.</p>
申请公布号 WO1995014306(A1) 申请公布日期 1995.05.26
申请号 US1994013164 申请日期 1994.11.16
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