VHF plasma source useful for etching and coating processes
摘要
A VHF plasma source, for generating gas discharges for plasma-assisted surface treatment and deposition processes, comprises a coaxial resonator consisting of an outer conductor (1) and a helical inner conductor (3), the h.f. power input point (8) being located on the inner conductor (3) and the gas being fed into the space between the two conductors (1,3).
申请公布号
DE4337119(A1)
申请公布日期
1995.05.24
申请号
DE19934337119
申请日期
1993.10.29
申请人
TECHNISCHE UNIVERSITAET DRESDEN, 01069 DRESDEN, DE
发明人
SCHADE, KLAUS, PROF. DR.-ING., 01468 BOXDORF, DE;KUSKE, JUERGEN, DR.-ING., 01239 DRESDEN, DE;STEPHAN, ULF, DIPL.-ING., 01309 DRESDEN, DE
