Composition for Polishing Crystalline Silicon and Germanium and Process.,申请号GB19670019936-传众专利搜索

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发明名称	Composition for Polishing Crystalline Silicon and Germanium and Process.
摘要
申请公布号	GB1188820(A)	申请公布日期	1970.04.22
申请号	GB19670019936	申请日期	1967.05.01
申请人	TIZON CHEMICAL CORPORATION	发明人	RAYMOND LEO LACHAPELLE
分类号	C09K3/14;H01L21/306	主分类号	C09K3/14
代理机构		代理人
主权项
地址

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