| 摘要 |
PURPOSE:To draw the pattern width or interval which are not equal to integer times the beam diameter, in accordance with design, by magnifying and converting CAD data in the manner in which are pattern width or interval becomes equal to the integer times the beam diameter of a raster type electron beam lithography equipment, converting the CAD data to artwork data, and reducing the data by a factor of the integer. CONSTITUTION:When design is performed by a CAD system 10, CAD data are formed in the design values of expected specification. The CAD data are magnified and converted on the CAD in the manner in which the pattern width or interval to be drawn becomes equal to integer times the beam diameter. By using a converting equipment 20 for converting the CAD data into lithography data which are drawn by an electron beam lithography equipment, the magnified CAD data are converted into the lithography data of the electron beam lithography equipment. When the obtained lithography data are grawn by a raster type electron beam lithography equipment 30, the pattern is drawn by reducing and converting the data by a factor of the integer. |
