发明名称 Method and apparatus for detecting the position of a substrate having first and second patterns of different sizes
摘要 A method of detecting a position of the substrate with respect to a particular direction, wherein the substrate has first and second patterns of different sizes in the particular direction and has a surface layer formed thereon includes the steps of detecting the first and second patterns to produce first and second data related to the position of the substrate; and predicting, by using the first and second data and the sizes of the first and second patterns in the particular direction, the position of the substrate as determined when the pattern size in the particular direction is sufficiently small.
申请公布号 US5418613(A) 申请公布日期 1995.05.23
申请号 US19920858881 申请日期 1992.03.27
申请人 CANON KABUSHIKI KAISHA 发明人 MATSUTANI, SHIGEKI
分类号 G03F9/00;(IPC1-7):G01B11/00 主分类号 G03F9/00
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