发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To attain high sensitivity to radiation by incorporating poly(hydroxystyrene), hexamethoxymethylmelanine and an acid generating agent. CONSTITUTION:This radiation sensitive resin compsn. contains poly (hydroxystyrene) as a 1st component, hexamethoxymethylmelanine as a 2nd component and an acid generating agent as a 3rd component. The acid generating agent is a substance which is decomposed by the action of radiation such as light, electron beams, X-rays or ion beams and generates an acid. The poly(hydroxystyrene) acts as a matrix resin which dissolves in an aq. alkali soln. and the hexamethoxymethylmelanine converts the poly (hydroxystyrene) into gel and makes it insoluble in the aq. alkali soln. This crosslinking reaction is accelerated by the catalytic action of an acid supplied as a product obtd. by decomposing the acid generating agent by irradiation.
申请公布号 JPH07134415(A) 申请公布日期 1995.05.23
申请号 JP19930156426 申请日期 1993.06.28
申请人 OKI ELECTRIC IND CO LTD 发明人 ITO TOSHIO;KOSUGE MAKI
分类号 G03F7/004;G03F7/028;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
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