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发明名称
SIMPLE METHOD FOR FORMING TiSi2 LAYER IN CONTACT HOLES
摘要
申请公布号
KR1019950005260(B1)
申请公布日期
1995.05.22
申请号
KR1019910023851
申请日期
1991.12.23
申请人
发明人
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主分类号
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