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发明名称
Plasmabearbeitungsverfahren und -vorrichtung
摘要
申请公布号
DE4114752(C2)
申请公布日期
1995.05.18
申请号
DE19914114752
申请日期
1991.05.06
申请人
MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP
发明人
ISHIDA, TOMOAKI, ITAMI, HYOGO, JP
分类号
C23F4/00;H01J37/32;H01L21/302;H01L21/3065;(IPC1-7):H01J37/32;H05H1/46
主分类号
C23F4/00
代理机构
代理人
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