发明名称 |
METHOD OF PRODUCING AT LEAST ONE RECESS IN A SURFACE OF A SUBSTRATE, DEVICE FOR CARRYING OUT THE SAID METHOD AND USE OF THE PRODUCT THUS OBTAINED |
摘要 |
With the proposed method, a masking device (5) with an aperture (6) is placed on the substrate (8), the masking device (5) and the region to be etched (90) on the substrate surface (9) forming a hollow chamber (11) which communicates with the reaction chamber (4) only via the aperture (6). The recess (10) is produced with the aid of corrosive radicals produced in the reaction chamber. In this way, a recess (10) with a smooth and precisely adjustable depth contour is obtained. |
申请公布号 |
WO9513525(A1) |
申请公布日期 |
1995.05.18 |
申请号 |
WO1994DE01274 |
申请日期 |
1994.10.28 |
申请人 |
SIEMENS AKTIENGESELLSCHAFT;PETERS, DETHARD |
发明人 |
PETERS, DETHARD |
分类号 |
G01L9/04;C23F4/00;G01L9/00;G01L19/06;H01L21/302;H01L21/3065 |
主分类号 |
G01L9/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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