发明名称 Thin film transistor and active matrix liquid crystal display device having reduced photoelectric leakage current due to incident light
摘要 Leakage current due to light incident upon the semiconductor layer which forms the channel of a TFT is eliminated. An insulating layer is formed between one of source and drain electrodes and the semiconductor layer over a distance which is longer than a hole-electron recombination distance, from all the edges of at least one of the source and drain electrodes of the TFT so that it overlaps the semiconductor layer.
申请公布号 US5416340(A) 申请公布日期 1995.05.16
申请号 US19930071746 申请日期 1993.06.09
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 YOSHIDA, TOSHIHIKO;ATSUMI, MASAKAZU;MATSUMOTO, TAKESHI
分类号 G02F1/133;G02F1/136;G02F1/1368;H01L27/12;H01L29/78;H01L29/786;(IPC1-7):H01L27/01 主分类号 G02F1/133
代理机构 代理人
主权项
地址