| 摘要 |
PURPOSE:To obtain a resist compsn. excellent in resolution by specifying the weight average mol.wt. and the dispersion degree of the matrix resin. CONSTITUTION:This resist compsn. is a chemical amplification-type negative resist compsn. consisting of a matrix resin, crosslinking agent and acid producing agent. The matrix resin has 2000-5000 weight average mol.wt. and <1.3 dispersion degree. The resin in this range of mol.wt. gives a proper dissolution rate of unexposed area of the resist with an alkali developer so that, for example, an extremely large effect is obtd. for the resolution of a blank pattern in which the space width is narrower than the line width. An especially preferable example of the resin is polyvinylphenol having the mol.wt. and dispersion degree controlled to be in the ranges above described. The polyvinylphenol is advantageous since its mol.wt. and dispersion degree can be controlled to desired values. |
