发明名称 THIN FILM EL ELEMENT AND MANUFACTURE THEREOF AND SPUTTERING TARGET USED THEREFOR
摘要 PURPOSE:To achieve stable driving and long life span by using a chemically stable oxide for an emission layer and insulating layer. CONSTITUTION:A solid solution of SnO2 and In2O3 or a transparent conductive 'film of such as ZnO:Al is formed on a transparent substrate 1 so as to manufacture a transparent striped electrode 3 by photolithography and etching. An insulating layer 5 of SiO2, Y2O3, etc., or of combination of these, is formed on the layer by electron beam deposition, etc. An insulating layer 9 similar to the layer 5 is formed thereon, and electrodes 11 of such as Al, Au are formed thereon crossing the electrode 3 perpendicularly, and EL emission is generated from an emission layer 7 by applying A.C. voltage between the respective electrodes. An organic metal compound forming an emission center is added to metal alkoxide, which is applied on the substrate so as to form a thin film emission layer after heating and crystallization. Each layer can be formed without using high vacuum state in each process, while stable driving, reduction in driving voltage, and longer life span of an element can be achieved by using chemically stable oxides for the layers 5, 7.
申请公布号 JPH07122365(A) 申请公布日期 1995.05.12
申请号 JP19930266859 申请日期 1993.10.26
申请人 FUJI XEROX CO LTD 发明人 TORIGOE KAORU
分类号 C09K11/59;H01L33/08;H01L33/30;H01L33/34;H01L33/42;H05B33/10;H05B33/12;H05B33/14;H05B33/22 主分类号 C09K11/59
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