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经营范围
发明名称
Process and apparatus for chemical vapour deposition.
摘要
申请公布号
EP0409603(B1)
申请公布日期
1995.05.10
申请号
EP19900307873
申请日期
1990.07.19
申请人
FUJITSU LIMITED
发明人
TANAKA, HITOSHI
分类号
C23C16/44;C23C16/455;C23C16/52;H01L21/205;(IPC1-7):C23C16/44
主分类号
C23C16/44
代理机构
代理人
主权项
地址
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