发明名称 STRUCTURE FOR USE IN PRODUCING SEMICONDUCTOR DEVICES WITH BURIED CONTACTS AND METHOD FOR ITS PREPARATION.
摘要 <p>An improved structure and method for use in producing semiconductor devices with buried contacts and particularly photovoltaic devices, such as solar cells, that have conductive material (22) in grooves (20) extending inwardly of one major surface (12) of the body (10), the structure having a plurality of trenches (14) formed in the body to a predetermined depth greater than the depth of the conductive grooves (20), which trenches aid in isolating and defining the edges of semiconductor devices or solar cells, and provide means for aiding in the separation of separate semiconductor devices or solar cells from the structure by cutting the structure through the bottom of selected trenches (14).</p>
申请公布号 EP0651914(A1) 申请公布日期 1995.05.10
申请号 EP19940917430 申请日期 1994.05.20
申请人 AMOCO CORPORATION 发明人 NARAYANAN, SRINIVASAMOHAN;WOHLGEMUTH, JOHN, H.;RONCIN, STEVEN, P.
分类号 H01L21/74;H01L21/762;H01L31/0224;H01L31/0236;H01L31/18;(IPC1-7):H01L31/04;H01L31/022 主分类号 H01L21/74
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