发明名称 |
Optical end point detection methods in semiconductor planarizing polishing processes |
摘要 |
A semiconductor processing method of detecting polishing end point from a polishing planarization process includes: a) impinging laser light onto an area of an outermost surface of a semiconductor substrate at an angle of incidence of at least 70 DEG from a line normal relative to the substrate (at least 60 DEG for s-polarized light), the impinged laser light predominantly reflecting off the area as opposed to transmitting therethrough; b) measuring intensity of the light reflected off the area; c) polishing the substrate outermost surface; d) repeating step "a" then step "b"; and e) comparing a prior measured intensity of reflected light with a later measured intensity of reflected light to determine a change in degree of planarity of the semiconductor substrate outermost surface as a result of polishing.
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申请公布号 |
US5413941(A) |
申请公布日期 |
1995.05.09 |
申请号 |
US19940178663 |
申请日期 |
1994.01.06 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
KOOS, DANIEL A.;MEIKLE, SCOTT |
分类号 |
B24B37/04;B24B49/12;G01B11/30;(IPC1-7):G01D21/00 |
主分类号 |
B24B37/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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