INSPECTION METHOD, SCANNING ALIGNER WHEREIN THE INSPECTION METHOD IS USED AND MANUFACTURE OF DEVICE WHEREIN THE METHOD IS USED

摘要

PURPOSE:To provide a scanning aligner having a foreign matter inspection device whose constitution is not complicated. CONSTITUTION:In a device wherein a circuit pattern of a reticle 4 is projected onto a wafer 7 by scanning the reticle 4 mounted on a reticle stage 5 and the wafer 7 mounted on a wafer stage to exposure light from an illumination system 1 by moving the reticle stage 5 and the wafer stage, a foreign matter inspection device 3 is moved to an exposure position before scanning exposure and the foreign matter in a surface of the reticle 4 is detected while scanning the reticle 4 mounted on the reticle stage 5 by movement of the reticle stage 5.