发明名称 |
PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE AND PLATE MAKING METHOD |
摘要 |
PURPOSE:To obtain a photosensitive lithographic plate without the printing durability being decreased, excellent in sensitivity and developability and capable of erasing the film edge part of an original by providing a positive photosensitive composition layer on a sandblasted and anodically oxidized substrate. CONSTITUTION:A positive photosensitive composition layer contg. an O-quinone diazide compd. alkali-soluble resin and clathrate compd. is provided on a sandblasted and anodically oxidized substrate. The O-quinone diazide compd. is a polycondensed resin having an O-quinone diazide group and >=3000mol.wt., and the clathrate compd. is preferably selected from cyclic D-glucans and cyclophanes. A hydrophilic layer is preferably provided on the substrate which has been sandblasted, anodically oxidized and sealed. This positive photosensitive lithographic printing plate is picture-exposed with a developer contg. alkali metal silicate. As a result, a deposit is not formed in the developer bath. |
申请公布号 |
JPH07114178(A) |
申请公布日期 |
1995.05.02 |
申请号 |
JP19940190163 |
申请日期 |
1994.07.21 |
申请人 |
KONICA CORP;MITSUBISHI CHEM CORP |
发明人 |
TONO KATSUHIKO;FUKUMURO IKU;MATSUBARA SHINICHI;SASAKI MITSURU;OTA KATSUKO;MATSUO FUMIYUKI |
分类号 |
G03F7/022;B41N3/00;G03F7/00;G03F7/023;G03F7/32;(IPC1-7):G03F7/022 |
主分类号 |
G03F7/022 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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