发明名称 THERMAL TREATMENT METHOD OF AMORPHOUS SILICON SOLAR CELL
摘要 The heat treatment for enhancement of device efficiency and stabilization of film quality in photoelectric conversion device using amorphous silicon comprises (a) applying reverse bias voltage 0.5-5.0 V to both sides of electrodes of solar cell, i.e. P and N layers to countervail electric field of solar cell itself, (b) heating the solar cell in atmosphere of vacuum, nitrogen or hydrogen gas at 60-150 deg.C for 30-60 min.
申请公布号 KR950004594(B1) 申请公布日期 1995.05.02
申请号 KR19890005840 申请日期 1989.04.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KI, IL - HWAN
分类号 H01L31/12;(IPC1-7):H01L31/12 主分类号 H01L31/12
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