发明名称 |
THERMAL TREATMENT METHOD OF AMORPHOUS SILICON SOLAR CELL |
摘要 |
The heat treatment for enhancement of device efficiency and stabilization of film quality in photoelectric conversion device using amorphous silicon comprises (a) applying reverse bias voltage 0.5-5.0 V to both sides of electrodes of solar cell, i.e. P and N layers to countervail electric field of solar cell itself, (b) heating the solar cell in atmosphere of vacuum, nitrogen or hydrogen gas at 60-150 deg.C for 30-60 min.
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申请公布号 |
KR950004594(B1) |
申请公布日期 |
1995.05.02 |
申请号 |
KR19890005840 |
申请日期 |
1989.04.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KI, IL - HWAN |
分类号 |
H01L31/12;(IPC1-7):H01L31/12 |
主分类号 |
H01L31/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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