发明名称 VERTICAL SUBSTRATE STAGE DEVICE
摘要 <p>PURPOSE:To eliminate tension irregularity of a constant tension spring automatically, to eliminate the need for large thrust margin on a drive device and to realize compactness of a device providing a stand which reciprocates and moved freely, a constant tension spring which offsets gravity of the stand by tension and a tension compensation means. CONSTITUTION:A vertical substrate stage device E-1 comprises an X stage 2 which reciprocates and moved freely, a Y stage 3 which is a stand to reciprocate and move freely in a vertical direction, a wafer chuck 4 provided to the Y stage 3, an X driving device, a linear motor 5 and a constant tension spring 6. The wafer chuck 4 moves successively by a necessary amount to an X direction and a Y direction based on a specified command signal while monitoring a position thereof by reflection light of a Y mirror 7a and an mirror 7b, and carries out movement of a wafer delivery position and positioning of each exposure region. Furthermore, a load on each linear motor 5 is reduced by offsetting gravity of an entirety of the Y stage 3 by tension of the constant tension spring 6.</p>
申请公布号 JPH07115056(A) 申请公布日期 1995.05.02
申请号 JP19930281909 申请日期 1993.10.15
申请人 CANON INC 发明人 KORENAGA NOBUSHIGE;SAITO MASAMICHI
分类号 B23Q1/00;B23Q1/62;B23Q1/72;B23Q5/22;B23Q11/00;G03F7/20;H01L21/027;H01L21/68;H01L21/687;(IPC1-7):H01L21/027;B23Q1/58 主分类号 B23Q1/00
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