发明名称 Semiconductor device with improved element isolation and operation rate
摘要 A lower electrode of a capacitor for use in a semiconductor device includes a first semiconductor layer having a predetermined impurity concentration and a second semiconductor layer having an impurity concentration higher than that of the first semiconductor layer. As a result, intensification of an electric field at an end portion of the capacitor can be reduced. In addition, a word line is formed of a buffer layer and a main conductor layer to reduce a parasitic capacitance between the lower electrode of the capacitor and the word line.
申请公布号 US5412237(A) 申请公布日期 1995.05.02
申请号 US19930026359 申请日期 1993.03.04
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 KOMORI, SHIGEKI;TSUKAMOTO, KATSUHIRO
分类号 H01L27/04;H01L21/02;H01L21/285;H01L21/822;H01L21/8242;H01L27/10;H01L27/108;H01L29/41;(IPC1-7):H01L27/108;H01L29/76;H01G4/06;G11C11/34 主分类号 H01L27/04
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